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GZF-6630 Free Oxygen Nitrogen High Temperature Vacuum Drying Oven for Semiconductors
GZF-6630 Free Oxygen Nitrogen High Temperature Vacuum Drying Oven for Semiconductors

GZF-6630 Free Oxygen Nitrogen High Temperature Vacuum Drying Oven for Semiconductors

The GZF-6630 Free Oxygen Nitrogen Vacuum drying oven is designed for Semiconductor applicaiton with max 400 degree.It can be used for high-temperature baking, temperature drying, low vacuum sealing testing, oxygen free treatment, high-temperature stress relief, high-temperature curing and other applications of products an

Products Description

Model No.GZF-6630
Power suupplyAC380V/50Hz
Rated power25KW
 Temperature range

Rt~400℃

Temperature resolution0. 1℃
Temperature fluctuation±0.3℃
Heating range1~5℃/min
Vacuum degree0~99.99KPa
Chamber size680*680*1370mm
Oxygen Range
1ppm~25%
Oxygen accuracy0~1000ppm±1ppm,1%~25%±0.1%
Temperature controlPID programmable control
Sample tray12pcs max loading 20kg
Temperature sensorK type thermocouple
Machine dimension980mm*1600m*1620mm
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