CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation

CHY-T12100A-3Z4C 1200 degree CVD system is combined with a 1200 degree vacuum tube furnace, one 3 gas mixer with MFC accuracy gas flow control and a rotary vacuum pump for max 100Pa degree. It is widely used for laboratory 2D material preparation.

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Products Description

Modle No.	CHY-T1250A-3Z4C	CHY-T1260A-3Z4C	CHY-T1280A-3Z4C	CHY-T12100A-3Z4C
Heating zones	Single heating zone; two heating zone or three heating zone for option
Heating zone length	440mm
Constant temperature zone length	200mm
Tube Material	high purity quartz tube
Tube Dimension(mm)	O.D50I.D44L1000	O.D60I.D54L1000	O.D80I.D74L1000	O.D100I.D94L1000
Thermcouple	K type
Maximum heating temper	1150 dgree
Heating rate	20c/min, adjustable suggestion 10 degree/min
Heating element	Fe-Co-Al by Mo alloy
Sealing Method	stainless steel vacuum flange
Vacuum Air-tightness	9.8×10-4Pa
Temperature Accuracy	±1℃
Control Mode	Intelligent PID programmable Control, 30 steps sintering curve restore
Mass Flow Controller	3 gas way mass flow controller
Flowmeter Core	304 stainless steel
Measure Accuracy	+/- 1.0% F.S
Pressure Range	-0.1~0.15MPa
A way gas range	0~100SCCM
B way gas range	0~200SCCM
C way gas range	0~500SCCM, or as customized
Vacuum Pump	VRD-4C
Power Supply	AC220V 50Hz